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High-Vacuum Multi-Arc Ion Coating System Ionic Thin Film Coater Ionized Plating Layer Tester Cathodic Arc Deposition Device

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High-Vacuum Multi-Arc Ion Coating System Ionic Thin Film Coater Ionized Plating Layer Tester Cathodic Arc Deposition Device

High-Vacuum Multi-Arc Ion Coating System Ionic Thin Film Coater Ionized Plating Layer Tester Cathodic Arc Deposition Device
High-Vacuum Multi-Arc Ion Coating System Ionic Thin Film Coater Ionized Plating Layer Tester Cathodic Arc Deposition Device High-Vacuum Multi-Arc Ion Coating System Ionic Thin Film Coater Ionized Plating Layer Tester Cathodic Arc Deposition Device High-Vacuum Multi-Arc Ion Coating System Ionic Thin Film Coater Ionized Plating Layer Tester Cathodic Arc Deposition Device High-Vacuum Multi-Arc Ion Coating System Ionic Thin Film Coater Ionized Plating Layer Tester Cathodic Arc Deposition Device High-Vacuum Multi-Arc Ion Coating System Ionic Thin Film Coater Ionized Plating Layer Tester Cathodic Arc Deposition Device High-Vacuum Multi-Arc Ion Coating System Ionic Thin Film Coater Ionized Plating Layer Tester Cathodic Arc Deposition Device

Large Image :  High-Vacuum Multi-Arc Ion Coating System Ionic Thin Film Coater Ionized Plating Layer Tester Cathodic Arc Deposition Device

Product Details:
Place of Origin: Guangdong, China
Brand Name: LONROY
Payment & Shipping Terms:
Minimum Order Quantity: 1
Price: $1,000

High-Vacuum Multi-Arc Ion Coating System Ionic Thin Film Coater Ionized Plating Layer Tester Cathodic Arc Deposition Device

Description
Machine Type: Multi-Arc Ion Coating System Ionic Thin Film Coate Voltage: 220 V
Power(w): / Dimension(l*w*h): 1900*800*1900mm
Warranty: 1 Year Weight (kg): 100
Highlight:

High-Vacuum Ion Coating System

,

Cathodic Arc Deposition Device

,

Ionic Thin Film Coater

Products Description
High-Vacuum Multi-Arc Ion Coating System Ionic Thin Film Coater Ionized Plating Layer Tester Cathodic Arc Deposition Device

Brief Introduction The LR-CK107 is a high-vacuum multi-arc ion coating system designed for the preparation of multi-component amorphous alloys, metal compounds (such as oxide and nitride thin films in oxygen or nitrogen atmospheres), nanoparticle catalyst films, and thermoelectric thin films using thermoelectric material targets.
High-Vacuum Multi-Arc Ion Coating System Ionic Thin Film Coater Ionized Plating Layer Tester Cathodic Arc Deposition Device
Detailed Introduction The LR-CK107 utilizes arc discharge to ionize conductive materials. Leveraging the excellent diffraction characteristics of the process, it generates high-energy ions that are deposited onto substrates—particularly porous ones like nickel foam—to create nanoscale coatings or nanoparticles. The system comprises a coating chamber, multi-arc targets, a multi-arc power supply, a pulsed bias power supply, a sample stage, heating elements, a vacuum system, a gas delivery system, and a semi-automatic control system (PLC + touchscreen). It features an integrated design combining the main unit and control system for ease of operation, as well as a compact structure with a small footprint. This series of equipment is widely used in universities and research institutes for teaching and experimental research, as well as by manufacturing enterprises for preliminary exploratory experiments and new product development, earning high praise from users.
High-Vacuum Multi-Arc Ion Coating System Ionic Thin Film Coater Ionized Plating Layer Tester Cathodic Arc Deposition Device
Brief Introduction The LR-CK107 is a high-vacuum multi-arc ion coating system designed for the preparation of multi-component amorphous alloys, metal compounds (such as oxide and nitride thin films in oxygen or nitrogen atmospheres), nanoparticle catalyst films, and thermoelectric thin films using thermoelectric material targets.
High-Vacuum Multi-Arc Ion Coating System Ionic Thin Film Coater Ionized Plating Layer Tester Cathodic Arc Deposition Device
Detailed Introduction The LR-CK107 utilizes arc discharge to ionize conductive materials. Leveraging the excellent diffraction characteristics of the process, it generates high-energy ions that are deposited onto substrates—particularly porous ones like nickel foam—to create nanoscale coatings or nanoparticles. The system comprises a coating chamber, multi-arc targets, a multi-arc power supply, a pulsed bias power supply, a sample stage, heating elements, a vacuum system, a gas delivery system, and a semi-automatic control system (PLC + touchscreen). It features an integrated design combining the main unit and control system for ease of operation, as well as a compact structure with a small footprint. This series of equipment is widely used in universities and research institutes for teaching and experimental research, as well as by manufacturing enterprises for preliminary exploratory experiments and new product development; it is highly acclaimed by users.
High-Vacuum Multi-Arc Ion Coating System Ionic Thin Film Coater Ionized Plating Layer Tester Cathodic Arc Deposition Device
High-Vacuum Multi-Arc Ion Coating System Ionic Thin Film Coater Ionized Plating Layer Tester Cathodic Arc Deposition Device
High-Vacuum Multi-Arc Ion Coating System Ionic Thin Film Coater Ionized Plating Layer Tester Cathodic Arc Deposition Device
High-Vacuum Multi-Arc Ion Coating System Ionic Thin Film Coater Ionized Plating Layer Tester Cathodic Arc Deposition Device
High-Vacuum Multi-Arc Ion Coating System Ionic Thin Film Coater Ionized Plating Layer Tester Cathodic Arc Deposition Device
Specification
Technical Specifications
Item
Specification
1. Vacuum chamber
Ф500×H420mm, 304 stainless steel, front door opening structure; Chamber heating temperature: room temperature ~ 350±1℃;
2. Vacuum system
A high vacuum system composed of a composite molecular pump + direct-coupled rotary vane pump + high vacuum valve, and a digital
display composite vacuum gauge;
3. Vacuum limit
Better than 6.0×10-5Pa (no load, after baking and degassing);
4. Leak rate
Equipment pressure boost rate ≤0.8Pa/h;Equipment pressure maintenance: 12 hours after stopping the pump, the vacuum is ≤10Pa;
5. Pumping speed
(No load) Pumped from the atmosphere to 5.0×10-3Pa≤15min;
6. Substrate table size
Φ150mm, 3 rotation stations;
7. Substrate stage rotation
Substrate rotation: 0~20 rpm;
8. Sputtering target
DN100 new magnetic filter multi-arc target 2 sets
9. Pulse bias power supply
-1000V, 1 set;
11. Control method
PLC+touch screen human-machine interface semi-automatic control system;
12. Alarm and protection
Alarm and implement corresponding protection measures for abnormal conditions such as water shortage, overcurrent and overvoltage,
circuit breakage, etc. in pumps and electrodes; complete logic program interlock protection system;
13. Land occupation
(Host) L1900×W800×H1900(mm).
Our Advantages
High-Vacuum Multi-Arc Ion Coating System Ionic Thin Film Coater Ionized Plating Layer Tester Cathodic Arc Deposition Device

Contact Details
DONGGUAN LONROY EQUIPMENT CO LTD

Contact Person: Kaitlyn Wang

Tel: 19376687282

Fax: 86-769-83078748

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