| 유형: | 테스트 머신 | 정확도 등급: | 높은 정확도 |
|---|---|---|---|
| 정확성: | / | 애플리케이션: | 자동 테스트 |
| 맞춤형 지원: | OEM, ODM, OBM | 힘: | - |
| 보호 등급: | IP56 | 전압: | 220 v |
| 보증: | 1년 | 스펙트럼 분석 범위: | 380nm-1100nm |
| 스폿 크기 측정: | 1-5mm | 필름 두께의 절대적인 정밀도: | 0.2% 또는 2nm 중 더 큰 값 |
| 필름 두께 안정성: | 0.05nm보다 우수 | ||
| 강조하다: | reflective film thickness meter,optical constants tester machine,film thickness uniformity tester |
||
Reflective Film Thickness Meter Optical Constants Tester Film Thickness Uniformity Test Machine
I. Overview
The LR-A428 reflective film thickness meter utilizes the principle of reflection interference for non-destructive measurement. By analyzing the interference pattern formed by the reflected light from the film surface and the reflected light from the interface between the film and the substrate, along with the R-Theta stage, it can be compatible with samples ranging from 6 to 12 inches. It can perform rapid scanning of the entire sample, quickly and accurately measuring information such as film thickness and optical constants, and evaluating the uniformity of film thickness.
1. Optical film measurement solution;
2. Non-contact, non-destructive measurement;
3. The core algorithm supports the analysis of thin films to thick films, and single-layer films to multi-layer films.
4. Measurement accuracy of film thickness repeatability: 0.02 nm
5. Fully automatic measurement. The number and position of measurement points can be edited as needed in the Recipe.
II. Product Features
1. Utilizing a high-intensity halogen light source, the spectrum covers the range from ultraviolet to near-infrared.
2. It adopts a highly integrated design of optics, mechanics and electronics, featuring a small size and easy operation.
3. Based on the principle of interference of reflected light at the interface and the lower interface of the thin film layer, it is easy to analyze from a single layer to multiple layers.
4. Equipped with powerful core analysis algorithms: FFT is used to analyze thick films, and curve fitting analysis method is employed to analyze the physical parameter information of thin films;
III. Product Applications
It is widely applied in the measurement of various types of protective films, organic films, inorganic films, metal films, coatings, etc.
Reflective Film Thickness Meter Optical Constants Tester Film Thickness Uniformity Test Machine
Technical Specification
|
Basic function |
Obtain film thickness values and R spectra |
|
Spectral analysis range |
380nm-1100nm |
|
Measure the spot size |
1-5mm |
|
Measurement accuracy of film thickness repeatability: |
0.02nm (100nm silicon-based SiO2 sample, 100 repeated measurements) |
|
Absolute precision of film thickness |
between 0.2% or 2nm, whichever is greater |
|
Film thickness stability |
better than 0.05nm |
|
Film thickness measurement range |
15nm~70um |
|
Sample stage |
Automated R-Theta mobile platform, sample stage diameter not less than 200mm |
|
* Testing method |
Automated testing at any multiple points to generate a thickness mapping map (1. circular/square, 2.Radial shape, 3. Center or |
|
Test speed (including vacuum chuck) |
5 points in 5 seconds, 25 points in 14 seconds, 57 points in 30 seconds |
|
Light source |
Standard halogen light source (with a lifespan of 10000 hours) |
|
Reflectivity simulation |
It can model different coating materials and simulate the reflectivity curve of the coating film system |
|
Analysis software |
up to hundreds of optical material constant databases, and supports user-defined optical material libraries; Provide modeling,simulation, and analysis capabilities for multi-layer isotropic optical thin films; |
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Sample testing table specifications |
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Measurable wafer sizes |
2 inches&4 inches&6 inches&8 inches&12 inches |
|
Wafer fixation method |
vacuum adsorption |
|
Moving range of the stage |
not less than 200mm * 200mm |
|
Manually place the sample, automatically map and measure, and the number and position of measurement points can be edited as needed in the Recipe |
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담당자: Kaitlyn Wang
전화 번호: 19376687282
팩스: 86-769-83078748
Korean
