| タイプ: | テストマシン | 精度クラス: | 高精度 |
|---|---|---|---|
| 正確さ: | / | 応用: | 自動テスト |
| カスタマイズされたサポート: | OEM、ODM、OBM | 力: | - |
| 保護クラス: | IP56 | 電圧: | 220 v |
| 保証: | 1年 | 再現性測定精度: | 0.01Nm |
| 入射角範囲: | 45〜90° | マッピングストローク: | 100*100mm (オプション) |
| サポートされているサンプルサイズ: | 200mmまで | ||
| ハイライト: | spectroscopic ellipsometer lab machine,mapping spectroscopic ellipsometry equipment,factory price spectral ellipsometer |
||
Mapping Spectroscopic Ellipsometer Spectral Ellipsometer Spectroscopic Ellipsometry Machine Factory Price
I. Overview
The ME-Mapping Spectral Ellipsometer is a customizable Mapping measurement spectrometer capable of mapping. It is equipped with an automatic Mapping measurement module and can quickly achieve self-defined mapping measurement characterization and analysis of film thickness and optical parameters through the measurement of ellipsometric parameters and transmission/reflection rates.
1. Complete solution for ellipsometry mapping and measurement of the entire substrate;
2. Supports product design and customization of functional modules, with one-click measurement drawing;
3. Configure the Mapping module, enabling full substrate custom multi-point positioning measurement capability;
4. The abundant database and geometric structure model library ensure a powerful data analysis capability.
II. Product Features
1. A composite light source consisting of deuterium lamps and halogen lamps is adopted, with the spectral range covering from ultraviolet to near-infrared (193 - 2500 nm).
2. High-precision rotation compensator modulation and PCRSA configuration enable high-speed acquisition of Psi/Delta spectral data.
3. It has the capability of fully customizing multi-point automatic positioning measurement for the entire substrate, and provides comprehensive film thickness detection and analysis reports;
4. Hundreds of material databases and multiple algorithm model libraries are available, covering the vast majority of current photovoltaic materials.
III. Product Applications
ME-Mapping is widely used in industrial applications such as OLED, LED, photovoltaic, and integrated circuits, enabling rapid measurement and characterization of large-area substrate film thickness, optical constants, and film thickness distribution.
Mapping Spectroscopic Ellipsometer Spectral Ellipsometer Spectroscopic Ellipsometry Machine Factory Price
Technical Specification
|
Model |
ME-Mapping |
|
Application positioning |
Automatic type |
|
Basic functions |
Psi/Delta, N/C/S, R/T and other spectra |
|
Analytical spectrum |
380-1000nm (support expansion to 193- 1650nm) |
|
Single measurement time |
S15s |
|
Repeatability measurement accuracy |
0.01nm |
|
Spot size |
Large spot 2-4mm, micro spot 200um/100um |
|
Refractive index repeatability accuracy |
0.0005
|
|
Incident angle range |
45-90° |
|
Incident angle adjustment method |
Automatic variable angle |
|
Focus method |
Automatic focus |
|
Mapping stroke |
100*100mm (optional) |
|
Supported sample size |
Up to 200mm |
コンタクトパーソン: Kaitlyn Wang
電話番号: 19376687282
ファックス: 86-769-83078748
Japanese
