The ME-Mapping Spectral Ellipsometer is a customizable Mapping measurement spectrometer capable of mapping. It is equipped with an automatic Mapping measurement module and can quickly achieve self-defined mapping measurement characterization and analysis of film thickness and optical parameters through the measurement of ellipsometric parameters and transmission/reflection rates.
1. Complete solution for ellipsometry mapping and measurement of the entire substrate;
2. Supports product design and customization of functional modules, with one-click measurement drawing;
3. Configure the Mapping module, enabling full substrate custom multi-point positioning measurement capability;
4. The abundant database and geometric structure model library ensure a powerful data analysis capability.
II. Product Features
1. A composite light source consisting of deuterium lamps and halogen lamps is adopted, with the spectral range covering from ultraviolet to near-infrared (193 - 2500 nm).
2. High-precision rotation compensator modulation and PCRSA configuration enable high-speed acquisition of Psi/Delta spectral data.
3. It has the capability of fully customizing multi-point automatic positioning measurement for the entire substrate, and provides comprehensive film thickness detection and analysis reports;
4. Hundreds of material databases and multiple algorithm model libraries are available, covering the vast majority of current photovoltaic materials.
III. Product Applications
ME-Mapping is widely used in industrial applications such as OLED, LED, photovoltaic, and integrated circuits, enabling rapid measurement and characterization of large-area substrate film thickness, optical constants, and film thickness distribution.
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