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Thông tin chi tiết sản phẩm:
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| Kiểu: | Máy kiểm tra | Lớp chính xác: | Độ chính xác cao |
|---|---|---|---|
| Sự chính xác: | / | Ứng dụng: | Kiểm tra tự động |
| Hỗ trợ tùy chỉnh: | OEM, ODM, OBM | Quyền lực: | - |
| Lớp bảo vệ: | IP56 | Điện áp: | 220 v |
| Bảo hành: | 1 năm | Độ chính xác đo lặp lại: | 0,01nm |
| Phạm vi góc sự cố: | 45-90° | Ánh xạ đột quỵ: | 100*100mm (tùy chọn) |
| Cỡ mẫu được hỗ trợ: | Lên đến 200mm | ||
| Làm nổi bật: | spectroscopic ellipsometer lab machine,mapping spectroscopic ellipsometry equipment,factory price spectral ellipsometer |
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Mapping Spectroscopic Ellipsometer Spectral Ellipsometer Spectroscopic Ellipsometry Machine Factory Price
I. Overview
The ME-Mapping Spectral Ellipsometer is a customizable Mapping measurement spectrometer capable of mapping. It is equipped with an automatic Mapping measurement module and can quickly achieve self-defined mapping measurement characterization and analysis of film thickness and optical parameters through the measurement of ellipsometric parameters and transmission/reflection rates.
1. Complete solution for ellipsometry mapping and measurement of the entire substrate;
2. Supports product design and customization of functional modules, with one-click measurement drawing;
3. Configure the Mapping module, enabling full substrate custom multi-point positioning measurement capability;
4. The abundant database and geometric structure model library ensure a powerful data analysis capability.
II. Product Features
1. A composite light source consisting of deuterium lamps and halogen lamps is adopted, with the spectral range covering from ultraviolet to near-infrared (193 - 2500 nm).
2. High-precision rotation compensator modulation and PCRSA configuration enable high-speed acquisition of Psi/Delta spectral data.
3. It has the capability of fully customizing multi-point automatic positioning measurement for the entire substrate, and provides comprehensive film thickness detection and analysis reports;
4. Hundreds of material databases and multiple algorithm model libraries are available, covering the vast majority of current photovoltaic materials.
III. Product Applications
ME-Mapping is widely used in industrial applications such as OLED, LED, photovoltaic, and integrated circuits, enabling rapid measurement and characterization of large-area substrate film thickness, optical constants, and film thickness distribution.
Mapping Spectroscopic Ellipsometer Spectral Ellipsometer Spectroscopic Ellipsometry Machine Factory Price
Technical Specification
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Model |
ME-Mapping |
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Application positioning |
Automatic type |
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Basic functions |
Psi/Delta, N/C/S, R/T and other spectra |
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Analytical spectrum |
380-1000nm (support expansion to 193- 1650nm) |
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Single measurement time |
S15s |
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Repeatability measurement accuracy |
0.01nm |
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Spot size |
Large spot 2-4mm, micro spot 200um/100um |
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Refractive index repeatability accuracy |
0.0005
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Incident angle range |
45-90° |
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Incident angle adjustment method |
Automatic variable angle |
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Focus method |
Automatic focus |
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Mapping stroke |
100*100mm (optional) |
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Supported sample size |
Up to 200mm |
Người liên hệ: Kaitlyn Wang
Tel: 19376687282
Fax: 86-769-83078748
Vietnamese
